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专供大学研究所倒梯形的耐高温FUTURREX负胶NR9-1500PY

发布日期:2024/11/26 16:48:13

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专供大学研究所倒梯形的耐高温FUTURREX负胶NR9-1500PY 
深圳市芯泰科光电有限公司
产品热线许经理 :13玖23八66554  扣扣:35捌9123零

FUTURREX  NEGATIVE RESIST NR9-1500PY

Description 
 
? Negative Resist NR9-1500PY is a negative tone photoresist designed for 365nm 
wavelength exposure using tools such as wafer steppers, scanning projection aligners, 
proximity printers contact printers. 
? After resist development, NR9-1500PY exhibits a negative-sloping resist sidewall profile, 
which facilitates a simple resist lift-off process. 
? These are the advantages of NR9-1500PY over other resists: - superior resolution capability - fast develop time - easy adjustment of the degree of resist undercut as a function of exposure energy - temperature resistance of up to 100°C - superior ivity in RIE process - shelf life exceeding 3 years at room temperature storage. 
? The formulation processing of NR9-1500PY were designed with regard to 
occupational environmental safety. The principal solvent in NR9-1500PY is 
cyclohexanone development of NR9-1500PY is accomplished in a basic water 
solution. 
 
Properties 
 
    ?    Solids content (%)                                                                                    24-28                        
    ?    Principal solvent                                                                                       cyclohexanone 
    ?    Appearance                                                                                              light yellow liquid 
    ?    Coating characteristic                                                                               very uniform,  
                                                                                                                            striation free 
    ?    Film thickness after 150°C hotplate bake for 60 s. 
           Coating spin speed, 40 s spin (rpm):                                                            (nm) 
800                                                                                                          2850-3150 
1000                                                                                                   2565-2835 
2000                                                                                                   1805-1995 
3000                                                                                                   1425-1575 
4000                                                                                                   1235-1365 
5000                                                                                                   1140-1260 
 
    ?    Sensitivity at 365 nm exposure wavelength (mJ/cm2 for 1μm thick film)  190 
    ?    Guaranteed shelf life at 25°C storage (years)                                           3      
Processing 
 
1. Application of resist by spin coating at ed spin speed for 40 s. 
 
2. Begin dispensing Edge Bead Remover EBR2 simultaneously onto the top bottom 
surfaces of the spinning, coated substrate through nozzles 0.5-1.0 cm the edge of 
the substrate as soon as edge bead forms (3-5 s after ceasing resist dispense). Stop 
dispensing EBR2 5 seconds prior to completion of spin coating cycle. 
 
3. 150°C hotplate bake for 60 s. (softbake) 
 
4. Resist exposure with a tool emitting 365 nm wavelength. 
 
5. 100°C hotplate bake for 60 s. (post-exposure bake) 
 
6. Resist development in Resist Developer RD6 by spray or immersion. 
Development time, including overdevelopment for 1.5 μm thick film, for example, is 12 s. 
To increase develop time to 60 s combine RD6/water 3:1. 
 
7. Resist rinse in deionized water until water resistivity reaches prescribed limit. 
 
8. Drying of resist. 
 
9. Removal of resist in Resist Remover RR4 at 110°C or in acetone. 
 
Note: The above procedure refers to substrates, which are good conductors of heat such as  
    silicon, GaAs etc. Bake times need to be increased by a factor of 3.5 for substrates that are  
poor conductors of heat such as glass. 
 
 
Hling Precautions 
 
     Negative Resist NR9-1500PY is a flammable liquid. Hle it with care. Keep it away   
     heat, sparks flames. Use adequate ventilation. It may be harmful if swallowed or  
      touched. Avoid contact with liquid, vapor or spray mist. Wear chemical goggles, rubber  
     gloves protective coating.