Description 

   ? Negative Resist NR9G-3000PY is a negative tone photoresist designed for 365 nm, 406 

         nm, 436 nm exposure wavelengths, using tools such as wafer steppers, scanning 

         projection aligners, proximity printers contact printers. 

   ? After resist development NR9G-3000PY exhibits a negative-sloping resist sidewall profile, 

         which facilitates a simple resist lift-off process. 

   ? The following are advantages of NR9G-3000PY over other resists: 

          -      superior resolution capability 

          -      fast develop time  

          -      easy adjustment of the degree of resist undercut as a function of exposure energy 

          -      temperature resistance of up to 100°C 

          -      easy resist removal in Resist Remover RR5 

          -      shelf life exceeding 1 year at room temperature storage at 23°C. 

   ? The formulation processing of NR9G-3000PY were designed with regard to 

         occupational environmental safety. The principal solvent in NR9G-3000PY is 

         cyclohexanone development of NR9G-3000PY is accomplished in a basic water 

         solution. 

 

 

Properties 

 

   ? Solids content (%)                                                                                     31-35 

   ? Principal solvent                                                                                        cyclohexanone 

   ? Appearance                                                                                               light yellow liquid 

   ? Coating characteristic                                                                                very uniform, 

                                                                                                                            striation free 

   ? Film thickness after 100°C hotplate bake for 300 s 

        Coating spin speed, 40 s spin (rpm):                                                          (nm) 

        800                                                                                                              5700-6300 

        3000                                                                                                            2850-3150 

        4000                                                                                                            2460-2720 

        5000                                                                                                            2140-2326 

    

  ? Sensitivity at 365 nm exposure wavelength (mJ/cm2 for 1 μm thick film)    30 

  ? Guaranteed shelf life at 23°C storage (years)                                              1 

Processing 

1. Application of NR9G-3000PY resist static dispense by spin coating at 3000 rpm for 

40 s. Acceleration 0 to 3000 rpm is conducted in less than 1 s. Amount of 

dispensed NR9G-3000PY is 7 mL per 6 inch diameter wafer. 

 

2. Softbake on a hotplate at 110°C for 90 s. 

 

3. Substrate cooling to room temperature. 

 

4. Resist exposure with a tool emitting light at wavelengths shorter than 440 nm. 

 

5. 110°C hotplate bake for 90 s. (post-exposure bake) 

 

6. Substrate cooling to room temperature. 

 

7. Resist development in Resist Developer RD6 or resist developer containing 2.38% 

TMAH by immersion agitation at 20-25°C. Development time for 3000 nm thick film 

is 16 s.  

 

8. Resist rinse in fast flowing stream of deionized water until water resistivity reaches 

prescribed limit. 

 

9. Drying of resist. 

 

10. Removal of resist in Resist Remover RR5 at room temperature. 

 

       Note: The above procedure refers to substrates, which are good conductors of heat such as 

       silicon, GaAs etc. Bake times need to be increased by a factor of 3.5 for substrates that are 

       poor conductors of heat such as 0.7 mm thick glass. 

 

 

Hling Precautions 

      Negative Resist NR9G-3000PY is a flammable liquid. Hle it with care. Keep it away  

      heat, sparks flames. Use adequate ventilation. It may be harmful if swallowed or  

      touched. Avoid contact with liquid, vapor or spray mist. Wear chemical goggles, rubber  

      gloves protective coating..