高粘附力、耐高温、干湿蚀刻、电镀专用和厚膜正胶
发布日期：2024/11/26 16:48:12
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高粘附力、耐高温、干湿蚀刻、电镀专用和厚膜正胶深圳市芯泰科光电有限公司
产品热线许经理 :13玖23八66554 扣扣：35捌9123零
深圳市芯泰科光电有限公司，创立于2014年，是一家服务于微电子领域的产品贸易及技术服务提供商。我们已经成为国内微电子制程领域和相关大学研究所信赖的合作伙伴；公司秉持以忠诚态度对待新旧客户，以客户满意为导向，提供优质高效率的专业服务，提供产品行销及技术支援解决方案。我们目标是成为一家新材料应用技术推广服务的专业供应商。
CEMI EXP-1500 Series Thick Film
EXP-1500 Series Thick Film Photoresist
Features
High resolution positive-tone photoresist designed for metal plating
applications.
?High solid content for thick film coating
?Vertical pattern profile
?Faster photospeed
?Good resistant to acidic metal plating solution
?Good toughness to tolerate plated metal stress
?Excellent adhesion to metal substrates
?Tailor made to customized specification (solid content,
2
viscosity, coating method, photospeed)
Proprietary Novolak Resin Structure
By implementing
(1) different substation groups on the benzene ring
(2) special monomers mixing copolymerization ratio,
we developed proprietary structure Novolak resin for thick film
photoresist. Which ideally meet requirements:
(1) Good optical transparency in UV region
(2) Good resistance to metal plating solutions
(3) Good toughness to tolerate the stress of plated metal
(4) Good adhesion to metal seed layers
EXP-1500 系列規格表(代表性、可客製)
EXP-1510 Typical Specifications
EXP-1510 Spin Curve
EXP-1510 Pattern Profile
Photospeed Eth Comparison
Photospeed Eop Comparison
Resolution Comparison
Dark Erosion (Film Loss) Performance
Resistance to Cu Plating Solution
Resistance to Cu Plating Solution
